ASML-AT1250 DUV193nm
Equipment according the age in good in good shape,
however only one wafer stage is currently working
2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"
Equipment inspection virtual or physical possible
Equipment according the age in good in good shape,
however only one wafer stage is currently working
2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"
Equipment inspection virtual or physical possible
AC Power Box, T/C Unit, T/H Controller 1+2, Chemical Cabinet, 4 Coater and 4 Developer
Last Time in production: 5/5/25
GSD 200E2, High Current Implanter (SN 080481)
ACT DB System, AC Power Box, T/C Unit 1+2, T/H Controller ESA 1+2, Chemical Cabinet 1, 2, 3
The Nexx Apollo PVD system is a fully automated Physical Vapor Deposition (PVD) tool using a multiple wafer multiple chamber design. The system deposits thin metal films used in interconnect metallization on wafers. It uses a staged vacuum system that allow short pump down time to achieve ultra high vacuum. The multi chamber design allows for precise control over all process parameters.
Completeness partial
- Z80 missing
- CDS not running
- Tool is EOL
3 DXZ/CXZ Chambers for Centura/P5000 Mainframe is transport rack
Other Lithography Exposure Tools
Exposure Tool still in production, located in cleanroom
Excimer Laser type: CYMER XLA165
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