Lithography Equipment

  1. ASML-AT1250 DUV193nm

    Other Lithography Equipment

    ASML-AT1250 DUV193nm

    Equipment according the age in good in good shape,

    however only one wafer stage is currently working 

    2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"

    Equipment inspection virtual or physical possible

  2. CANON FPA 3000 I4 (510-x87)

    Wafer Steppers: I-Line

    CANON FPA 3000 I4 (510-x87)

    - console at boxed PC with touch 

    - NIKON Reticle Changer

    - I Line Exposure, x5, 6 inch Reticle, NA 0.63, Cluster Modus Inline

    - boxed PC for windows XP need to be rebuild by buyer