ASML-AT1250 DUV193nm
Equipment according the age in good in good shape,
however only one wafer stage is currently working
2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"
Equipment inspection virtual or physical possible
Equipment according the age in good in good shape,
however only one wafer stage is currently working
2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"
Equipment inspection virtual or physical possible
AC Power Box, T/C Unit, T/H Controller 1+2, Chemical Cabinet, 4 Coater and 4 Developer
Last Time in production: 5/5/25
ACT DB System, AC Power Box, T/C Unit 1+2, T/H Controller ESA 1+2, Chemical Cabinet 1, 2, 3
Other Lithography Exposure Tools
Exposure Tool still in production, located in cleanroom
Excimer Laser type: CYMER XLA165
Automated Coating and Developing Cluster System
no missing parts
T/H controller 1 to 3 need service/repair
last time in production 10.1.2024
ACT8 DB System, 2 BCT, 2 COT, 3 DEV, 3 CHP, 1WEE, 10LHP, 2 ADH, 4 HHP, CWD,
The Tool is complete and is working, full usage for its purpose. Electronical manual exists. Located in cleanroom. ProcessUV-HardenProcedureEXP
The Tool is complete and is working, full usage for its purpose. Electronical manual exists. Located in cleanroom. ProcessUV-HardenProcedureEXP
- console at boxed PC with touch
- NIKON Reticle Changer
- I Line Exposure, x5, 6 inch Reticle, NA 0.63, Cluster Modus Inline
- boxed PC for windows XP need to be rebuild by buyer
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