The Nexx Apollo PVD system is a fully automated Physical Vapor Deposition (PVD) tool using a multiple wafer multiple chamber design. The system deposits thin metal films used in interconnect metallization on wafers. It uses a staged vacuum system that allow short pump down time to achieve ultra high vacuum. The multi chamber design allows for precise control over all process parameters.
One chamber partially disassembled
missing parts:Process Kits , Pyrometer Upper
It’s an AMAT Endura 5500 HP PVD Tool. Equipped with 2 Degas-Orienter, one Preclean II Chamber, 3 Narrow Body PVD Chambers and two Wide-Body PVD Chambers. For 6’’ Wafersize.
The Tool has been upgraded to a Vita Controller in March 2023.
It’s a Clusterline 200 II CW with 3 PVD Chambers (Pos3/4/5) and 1 Degass Chamber (Pos1). PM5 is configured with a hot Chuck and a Pyrometer. The transport was upgraded in 2025 with a new Brooks control system, which includes a new aligner.
This upgrade consists of:
Additionally, a cooler on the transport is included.
Available: end of September 2026
Other Physical Vapor Deposition Equipment
no Chuck, no PSUs, No Evs
beside this complete
Other Physical Vapor Deposition Equipment
no ESC, no PSUs, No Evs, no MFS´s,
No whole lower assambly where the ESC is installed
beside this complete
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