ASML-AT1250 DUV193nm
Equipment according the age in good in good shape,
however only one wafer stage is currently working
2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"
Equipment inspection virtual or physical possible
Equipment according the age in good in good shape,
however only one wafer stage is currently working
2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"
Equipment inspection virtual or physical possible
AC Power Box, T/C Unit, T/H Controller 1+2, Chemical Cabinet, 4 Coater and 4 Developer
Last Time in production: 5/5/25
ACT DB System, AC Power Box, T/C Unit 1+2, T/H Controller ESA 1+2, Chemical Cabinet 1, 2, 3
The Nexx Apollo PVD system is a fully automated Physical Vapor Deposition (PVD) tool using a multiple wafer multiple chamber design. The system deposits thin metal films used in interconnect metallization on wafers. It uses a staged vacuum system that allow short pump down time to achieve ultra high vacuum. The multi chamber design allows for precise control over all process parameters.
3 DXZ/CXZ Chambers for Centura/P5000 Mainframe is transport rack
Software: Win 10
OR 4000 WTM Controller
3x ENI Generator Racks
Chiller INR-498-011D
2x Remote Monitor
High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F
Software: Win 10
OR 4000 WTM Controller
3x ENI Generator Racks, Chiller INR-498-011D
2x Remote Monitor
High Density Plasma Process
Process Chambers: A,B,C
Orienter chamber F
System: 1x Mainframe
3x process chamber
1x Controller Rack
1x Chiller
3x ENI Generator Racks (Converted to separate water supply each Generator)
1x Controller Rack
x Chiller
3x ENI Generator Racks (Converted to separate water supply each Generator)
AMAT Vita/Delphin Controller
Tool will be sold without Software
SP203 Mainunit: 6 Inch Bernoulli Handling; Pinlesschuck 6 Inch; Exhaust Up; 1 Medium Double Hex; 2 Medium Single Hex; Software: Major Version 117; Minor Version 2015.08.21; Gem Version GEM 5.8;
3 Chemistry Cabinetts: Cabinett 1: Maintank and Buffertank; Cabinett 2: Maintank and Buffertank; Cabinett 3:
Maintank; Chemistry Controller-Dos
Wafer Size Range
Minimum: 150 mm
Maximum:150 mm
Set Size: 150 mm
Problems: Keyboard switching; voltage fluctuations; chemistry-cabinets heavily used; chemistry computer not original; modifications; FFU controller; 1 cabinet drain box repaired;
Automated Coating and Developing Cluster System
no missing parts
T/H controller 1 to 3 need service/repair
last time in production 10.1.2024
ACT8 DB System, 2 BCT, 2 COT, 3 DEV, 3 CHP, 1WEE, 10LHP, 2 ADH, 4 HHP, CWD,
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