P500045

4 Chambers 2 Chambers Etch, 2 Chambers CVD Teos

Software: Win 10 ; OR 4000 WTM Controller; 3x ENI Generator Racks, Chiller INR-498-011D; 2x Remote Monitor; High Density Plasma Process; Process Chambers: A,B,D; Orienter chamber F;Software: Win 10 ; OR 4000 WTM Controller; 3x ENI Generator Racks, Chiller INR-498-011D; 2x Remote Monitor; High Density Plasma Process; Process Chambers: A,B,D; Orienter chamber F;