Projection Optics: Projection Magnification: 5 : 1 Exposure Light: i-Line (Hg-Lamp 2,0kW) Numerical Aperture: 0,63 Field Size: 22mm
Standard Illumination: Exposure Light: i-Line Light Source: Hg-Lamp 2,0kW Intensity: ~6.119 Uniformity: ~1,63% Masking Blade: N/A
Printing Performance: Resolution: 0,35µm Depth of Focus: N/A Image Field Deviation: N/A Distortion: N/A
Focus/Leveling Performance: Focus Repeatability: N/A Leveling Repeatability: N/A Minimum Compensation Range: N/A
Wafer Alignment Performance: Lighting Source: BB + HeNe + iCal Signal Process: N/A System: N/A Mode: N/A
Standard Stage Specification: Step Accuracy: N/A Scaling: N/A Orthogonality: N/A
Standard Alignment Specification: Reticle Rotation Accuracy: N/A
Wafer Alignment: N/A
Reticle: Standard Size 6" square t=0.25" ( Patticle checker) ? N/A Material: N/A Pattern Material: N/A
Pellicle Frame: Pattern Side only Stand Off = 6.3mm? Yes
Reticle Particle Checker Specification: 6” PPC (PPC-40S6) Detection Resolution Glass Surface: 15µm Pellicle Surface: 20µm Detection Repeatability: >95%
Wafer: Size: Standard 8” ( 6” thru 8” SEMI Standard, JEIDA,Notch / Flat, Optional): 6” SEMI Standard Flat Throughput: >59wph (60 shot wafer)22mm ( 8” Wafer) N/A Throughput: >83wph (32shot wafer)22mm ( 6” Wafer) N/A
Environmental Chamber Specification: Cleanness: Class 1(>0.1µm) N/A Chamber Specifications: N/A Chamber Type: TBW-CD-80 Air Conditioner: N/A Refrigerant: R422D (Umstellung auf R422D im Mai 2016) Gram (g): N/A Pounds (lbs): N/A |