|
Item ID |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Make |
Model |
|
|
|
|
|
252024
|
Applied Materials |
200mm Centura II |
in Cluster Plasma Tools
AMAT 200mm Centura II DXZx:Centura MF II Software: Vita Controller Indexer: Narrow Body / Tilt out mit Dummy Wafer Storage Robot: HP+ Chamber: A -> DPS+ B -> DPS+ C -> IPS D -> ASP+ E -> Single Cooldown F -> Orienter
|
1
|
|
|
|
|
|
230352
|
Applied Materials |
P16-072 |
in Wet Processing Equipment
Ancolyzer P16-072:3 x Dosage Additive 2 x Slipstreams with pump 2 x Dosing VMS incl. Bleed & Feed Bulk Fill Tanks additional doses of H2O2 und H2SO4 Scanner incl. software
|
1
|
|
|
|
|
|
252684
|
AXCELIS NV8200P |
in Ion Implantation Equipment
AXCELIS NV8200P:-MCINV8201 -currently tool is still warm down
|
1
|
|
|
|
|
|
252685
|
AXCELIS NV8200P |
in Ion Implantation Equipment
AXCELIS NV8200P:MCINV8202 Tool is currently under Warm down.
|
1
|
|
|
|
|
|
250598
|
Axcelis Technologies |
OPTIMA_HD |
in Ion Implantation Equipment
|
1
|
|
|
|
|
|
242851
|
Kufner |
Batch Etching Basin (KOH) |
in Wafer Cleaners
Batch Etching Basin (KOH):Complete dip acid etching unit manufactured by Kufner, Germany. The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing si-wafers after grinding (KOH). Delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send
|
1
|
|
|
|
|
|
249646
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Configuration: left inline system; 8" wafer chuck; no transportation locks available; major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT (see pictures) no UPS installed. No printer installed. No MO-drive. EOL: optical parts
|
1
|
|
|
|
|
|
249647
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Configuration: left inline system; 8" wafer chuck; no transportation locks available; major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT (see pictures) no UPS installed. No printer installed. No MO-drive EOL: optical parts
|
1
|
|
|
|
|
|
250700
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Configuration: left inline system; 8" wafer chuck; Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping Coolant will be removed prior shipping Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts Last Time in production: 05/24
|
1
|
|
|
|
|
|
250701
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Configuration: left inline system; 8" wafer chuck; Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping Coolant will be removed prior shipping Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts Last Time in production: 05/24
|
1
|
|
|
|
|
|
242940
|
Kufner |
Batch Etching Basins |
in Wafer Cleaners
Dip-etch wet benchs:4x Dip-etch wet bench (1998) Complete dip acid etching unit manufactured by Kufner, Germany. The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing bonded si-wafers up to 80mm diameter. Delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send.
|
1
|
|
|
|
|
|
251212
|
Eaton |
GSD200E/80 |
in Ion Implantation Equipment
Eaton GSD200E/80 Highcurrent:Energy Config: | 0 - 80Kv Highcurrent | Serialnumber: | 80517 | Build Year: | 2000 | Date of first usage: | begin of year 2001 | Current Condition: | Good | CE-Conformity: | Yes | Cryo-Pumps: | CTI/Edwards Onboard; OB-8 + OB-10 fully refurbed included!! | Cryo-Kompressor: | CTI 9650 Low-Voltage | Turbo-Pumps: | Seiko STP A2203 fully refurbed included!! | Terminal-Rough-Pump: | without (Edwards Config) | Endstation Rough-Pump: | without (Edwards Config) | Wafersize: | 200mm | Disk-Type: | Si-coated Disk fully refurbed included!! | Wafer-Cooling: | no Disk-Chiller included ! | Gasbox: | 5-String, 4x Toxic-Low-Pressure | String1: | PH3 SDS-Low-Pressure Type VCR 1/2"; MFC MKS-1640A; 5sccm-AsH3 | String2: | BF3 SDS-Low-Pressure Type VCR 1/4"; MFC MKS-1640A; 5sccm-AsH3 | String3: | AsH3 SDS-Low-Pressure Type VCR 1/2"; MFC MKS-1640A; 5sccm-AsH3 | String4: | SIF4 Low-Pressure Type VCR 1/4"; MFC MKS-1640A; 5sccm-AsH3 | String5: | Argon Carriergas; MFC Brooks GF120 10sccm-N2 | Disk-Drive: | Direct-Drive | Dose-Type: | Regular | Source-Type: | ELS4 IHC-Source without Vaporizer | Hghvoltage-Transformer: | dry | Light-Tower: | red/yellow/green; no buzzer | Main-Workstation | SUN Solaris AXI 3HE | Second-Workstation | without | Software-Version: | 6.13.5.1 (no license included) | Network: | 24port 100MB Ethernet with Cisco Router-Kit | Cell-Controller: | V6 Type | Condition | tool run fully productive (24/7) between 15 and 80kv Energy until we switched it off on 07/2024 | Availability | Immediately. Start of shipment at the earliest 8 weeks after receipt of payment due to decontamination, dismantling and packing of the tool. Depending on the availability of external service providers | Notes: | slight corrosion spots on the frame, just a visual matter, see IMG_0810_n.jpg | | Clean-Room Table on frontside not included | | Original Lower Machine Front Panels not included (below the Table) | | Rough-Pumps not included | | Endstation Flowhood not included | | Disk-Chiller not included | | modified Plasma-Gun Power-Supply installed(TDK) | | Minor modifications on tool | | No Manual-Set/ no Spares | | If required, tool can be inspected on site |
|
1
|
|
|
|
|
|
238643
|
PVA TePla |
TWIN |
in Wafer Fabrication Equipment
|
1
|
|
|
|
|
|
251862
|
LAM Research Corp. |
SEZ203 |
in Wet Processing Equipment
LAM SEZ203:Completeness partial - Z80 missing - CDS not running - Tool is EOL
|
1
|
|
|
|
|
|
251863
|
LAM Research Corp. |
SEZ203 |
in Wet Processing Equipment
LAM SEZ203:Completeness partial - Z80 missing - Tool is EOL
|
1
|
|
|
|
|
|
251921
|
Mattson Technology |
SHS 2800 |
in Production RTP Tools
Mattson SHS 2800 RTP:Description: - Tool controller with Win7 (Updated 2019) - Remonte controller backside with monitor and keyboard - Temperatur measurement with Ripple Pyrometrie - High cooling with Jet Venturi System - Process: Oxid (BPSG + RTP Tempern)
|
1
|
|
|
|
|
|
251922
|
Mattson Technology |
SHS 2800 |
in Production RTP Tools
Mattson SHS 2800 RTP:Description: - Tool controller with Win7 (Updated 2018) - Remonte controller backside with monitor and keyboard - Temperatur measurement with Ripple Pyrometrie - High cooling with Jet Venturi System - Process: Oxid (BPSG + RTP Tempern)
|
1
|
|
|
|
|
|
223074
|
Novellus Systems |
Concept Two SPEED |
in Chemical Vapor Deposition Equipment
Novellus Concept Two SPEED (shrink):1 Mainframe w/ 3 Chambers Damages/Deficites: Chamber Turbo Pumps & HF/LF Generators EOL: Turbo Pumps no significant failures between last 3 years
|
1
|
|
|
|
|
|
242852
|
KVA GmbH |
automatisierte Si-Pellets Ätzbank |
in Wafer Cleaners
Pellet Edge Batch Etch Tool:Automtic dip-etch bench (2014) Complete dip acid etching unit manufactured by KVA, Austria. The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing semiconductor devices (Diode, Thyristor) up to 58 mm, delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send
|
1
|
|
|
|
|
|
239644
|
Ramgraber |
SST |
in Wafer Cleaners
Ramgraber SST:Used Configuration: Tank 1: EKC Tank 2: P1331 Tank 3 and 4: DMF Tank 5: IPA Known errors: Filter from tank 4 is leaking Heater 1 from tank 4 is broken Heater 3 from tank 4 is broken
|
1
|
|
|
F* |
|
|
240589
|
Semitool |
see attached type lable |
in Wafer Cleaners
Semitool Spin Rinser Dryer (2010):Single Spin Rinser Dryer as tabletop unit (s. attached picture). The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing up to 6" wafers, delivery of additional accessories possible (p.e. wafercarriers and adapters)
|
1
|
|
|
|
|
|
246568
|
Ramgraber |
see attached type lable |
in Wet Processing Equipment
Single-Wafer Spin Etch machine (2008):Complete single-wafer spin etching unit manufactured by Ramgraber Company (Germany). The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing up to 6" wafers, delivery of additional accessories is possible.
|
1
|
|
|
|
|
|
249206
|
Kufner |
3522 |
in Wet Processing Equipment
Single-Wafer Spin Etch machine (2008):Complete single-wafer spin etching unit manufactured by Kufner Company (Germany). The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing up to 6" wafers, delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send.
|
1
|
|
|
|
|
|
249207
|
Kufner |
3681 Nr. RAS6 |
in Wet Processing Equipment
Single-Wafer Spin Etch machine (2009):Complete single-wafer spin etching unit manufactured by Kufner Company (Germany). The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing up to 6" wafers, delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send.
|
1
|
|
|
|
|
|
249208
|
Kufner |
RÄS7 |
in Wet Processing Equipment
Single-Wafer Spin Etch machine (2010):Complete single-wafer spin etching unit manufactured by Kufner Company (Germany). The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing up to 6" wafers, delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send.
|
1
|
|
|
|
|
|
252586
|
LAM Research Corp. |
SEZ SP 203 |
in Wet Processing Equipment
Spin Etch Tool (8''tool):Spin Etch Tool (8''tool)
|
1
|
|
|
|
|
|
241408
|
Ramgraber |
Inline-Sprühätzanlage |
in Wafer Cleaners
Spray acid etching system (2008):Complete spray acid etching unit manufactured by Ramgraber Company (Germany). The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing up to 6" wafers, delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send.
|
1
|
|
€ 30,000.00 |
|
|
|
250488
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A1 M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last Time in production 1/1/24
|
1
|
|
|
|
|
|
250489
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last Time in production 1/1/24
|
1
|
|
|
|
|
|
250490
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes
|
1
|
|
|
|
|
|
250491
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#2 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Shinwa CP-I Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last time in production: 01.01.24
|
1
|
|
|
|
|
|
237878
|
Accretech |
UF3000EX-e |
in Wafer Fabrication Equipment
TSK-Prober 209:Probertyp | UF3000EX-e | Hinge Manipulator | No | Type of tester head plate | Agilent | Prober power supply rate | 230V | Chuck Type (Nickel, Gold, etc.) | Gold, Plane, Bernoulli | | | Network/connection | Yes | APCC Auto Probe Card Changer | No | Top Side Handling | Yes, V1 mit Bernoulli | Cleaning pad module | Yes |
The Prober is sold without the hinge!! (marked red in the picture)
|
1
|
|
|
|
|
|
250971
|
AP&S Customized Soln |
|
in Wet Processing Equipment
WET Clean Strip (8''tool):WET Clean Strip (8''tool)
|
1
|
|
|
|
|
|
250972
|
AP&S Customized Soln |
|
in Wet Processing Equipment
WET Clean Strip (8''tool):WET Clean Strip (8''tool), Currently the tool still working.
|
1
|
|
|
|
|
|
253558
|
Tel |
|
in Wet Processing Equipment
WET Clean with Ultrasonic Cleaner 8'':WET Clean with Ultrasonic Cleaner 8''
|
1
|
|
|
N* |
|
|
243576
|
ISM Industrie Servic |
n.a. |
in Wet Processing Equipment
Workbench for the removing of photo resists:Stainless steel workbench with ultrasonic bath for the removing of photoresisted silicon-wafers. The bench was built as custom-made product. The system is still in use, therefore there is the possibility for a sale on inspection. Capable of processing up to 6" wafers, delivery of additional accessories is possible. If there is a seriously buying interest, the technical specifications could be send.
|
1
|
|
|
|
|