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Sumitomo Laser Anneal
The main function of this System is to rapidly anneal semiconductor substrates using laser beam energy in order to recover defect crystals generated by pre-process such as ion implantation.The System is composed of Solid-state laser units, processing station, control devices, transfer robot and other accessory facilities. Although this system has been designed and manufactured so that it delivers the safety conforming to IEC 60825-1:2001, Safety of laser products-Part1: Equipment classification, requirements and user’s guide, the laser unit used in this system corresponds to a lass 4 laser product.
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