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	View All Offers Under Chemical Vapor Deposition Equipment » Switch Major Category		Click an item's ID# below for its full specifications , or: Group Offers into sub-categories under Chemical Vapor Deposition Equipment List all 11 product types under Chemical Vapor Deposition Equipment

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Item ID  Short Description Product Type / Details # Price Notes Make Model     245275 Applied Materials   EPI5  Epitaxial Cluster Tools in Epitaxial Reactors AMAT EPI CENTURA HTF (EPI5): Software Ver: B6.30 CB1 Amps: 300A SBC Type: V452 Flow Point Model: Nano Valve Gas Panel Type: Configurable Wafer Size: 200mm (with conversion kit 150mm is possible) M-Monitor: CRT 3 Chambers ATM EPI With digital Flow-Control of the cooling systems with interlock and passphrase (Simens PLC) HDD was upgraded to RAID System Tool called "EPI5" 1   218746 Applied Materials   P5000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment Amat P5000 CVD Tool: P500048 8 inch tool with 4 CVD chambers. Tool still in Production until (Planned until 3.23)  1   242019 ATV Technologie GmbH   PEO 602  Horizontal LPCVD Furnaces in LPCVD Furnaces ATV PEO 602 tube furnace: This furnace can handle wafers up to 150mm Configuration: N2 -  1500 l/min N2 -    660 l/min Forming Gas 660l/min Temperature Control 0°C – up to 500°C max. Free Ramping (up to 99 steps max., one step up to 99,99 °C max.) Stainless Steel Calotte 0 – 5kg 1   242018 ATV Technologie GmbH   PEO 603  Horizontal LPCVD Furnaces in LPCVD Furnaces ATV PEO 603 tube furnace : This furnace can handle wafers up to 150mm Configuration: N2 -  1500 l/min N2 -    660 l/min Forming Gas 660l/min Temperature Control 0°C – up to 500°C max. Free Ramping (up to 99 steps max., one step up to 99,99 °C max.) Stainless Steel Calotte 0 – 5kg 1   223074 Novellus Systems   Concept Two SPEED  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment Novellus Concept Two SPEED (shrink): 1 Mainframe w/ 3 Chambers  Damages/Deficites: Chamber Turbo Pumps & HF/LF Generators  EOL: Turbo Pumps   no significant failures between last 3 years 1   238827 Applied Materials   P5000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment P5000: From Chamber B following Parts are missing: RF Generator RF Match Baratron Turbo/Controller Chamber B,C,D are universal CVD etch chambers. 1   240853 Applied Materials   P5000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment P5000: 4x Standard SNIT Chambers 1   242656 Applied Materials   P5000  Cluster PECVD Tools in Production Tools P5000: CHAMBER A  Universal CVD Teos CHAMBER B  Universal CVD Teos CHAMBER C Mark2 Etch CHAMBER D Mark2 Etch The Tool is sold with 4 chambers and was productiv until August 2023 1   242682 Applied Materials   P5000  Cluster PECVD Tools in Production Tools P5000: CHAMBER A  x   Universal CVD Teos CHAMBER B  x   Universal CVD Teos CHAMBER D x   Universal CVD Teos Tool is sold with three chambers and was used in cleanroom until August 2023 1

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

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